Use Of Poly(Biphenyl Ether Sulfone)s

ABSTRACT

Use of an effective amount (ε) of a poly(biphenyl ether sulfone) (P2) for diluting a poly(aryl ether ketone) (P1) contained in a polymer composition (C1) consisting of the poly(aryl ether ketone) (P1) and, optionally in addition, one or more ingredients (A) other than the poly(aryl ether ketone) (P1) and the poly(biphenyl ether sulfone) (P2), while at least substantially maintaining the chemical resistance of the polymer composition (C1) in a chemical environment (E) which is more aggressive against the poly(biphenyl ether sulfone) (P2) than against the poly(aryl ether ketone) (P1).

CROSS-REFERENCE TO RELATED APPLICATIONS

The present application claims the benefit of U.S. application Ser. No. 60/752,922 and 60/752,951, both filed Dec. 23, 2005, the whole content of which is herein incorporated by reference.

FIELD OF THE INVENTION

The present invention relates to a new use of poly(biphenyl ether sulfone)s.

BACKGROUND OF THE INVENTION

Poly(biphenyl ether sulfone)s form a specific class of poly(aryl ether sulfone)s. These amorphous technopolymers are materials of choice notably for the ultimate in toughness with rather good chemical resistance, superior to most of commercially available transparent resins but lower than that of ultra-performance polymers like poly(aryl ether ketone)s.

Precisely, poly(aryl ether ketone)s offer an exceptional balance of technical properties, namely high melting point, excellent thermal stability, high stiffness and strength, good toughness and really excellent chemical resistance, including excellent resistance to environmental stress rupture resistance. However, the somewhat low glass transition of these materials limits theirs use in certain specific applications where the use temperature is above 170° C.: this is primarily because of the loss of modulus as the glass transition is traversed.

In lots of applications, the exceptional balance of technical properties offered by poly(aryl ether ketone)s is plainly appreciated and in said applications, there is e.g. no need for a material that would have improved load bearing capabilities above the T_(g) of neat poly(aryl ether ketone). An important problem remains still, due to the high cost of the poly(aryl ether ketone)s, which prevents the skilled person from using said poly(aryl ether ketone)s as widely as technically desirable for the encompassed applications, in particular when the shaped articles or at least some part(s) thereof are contacted, temporarily or permanently, with an aggressive chemical environment, and, more particularly when the shaped articles or at least one or more parts thereof are in addition submitted, temporarily or permanently, to stress.

There remains thus a strong need for a polymer composition with a lower cost than that of poly(aryl ether ketone) compositions, but a chemical resistance at least substantially the same as the one obtained by said poly(aryl ether ketone) compositions.

The challenge appeared tricky for the Applicant, especially in view of the teachings of U.S. Pat. No. 4,804,724, as commented below.

U.S. Pat. No. 4,804,724, the whole content of which is herein incorporated by reference, describes blends comprising a poly(biphenyl ether sulfone) and a poly(aryl ether ketone). Per U.S. Pat. No. '724, these blends, at intermediate compositions (such as 50 parts of PPSU and 50 parts of PEEK), exhibit an “interesting” balance of properties, in particular an intermediate toughness and modulus (thus intermediate load bearing capabilities) in the range between the (low) poly(aryl ether ketone) T_(g) and the (high) poly(biphenyl ether sulfone) T_(g), and an intermediate chemical resistance (including an intermediate environmental stress rupture resistance) in certain chemical environments (ethyl acetate, 1,1,1-trichloroethane, toluene and acetone) in the range between the (high) chemical resistance of the poly(aryl ether ketone) and the (substantially lower) chemical resistance of the poly(biphenyl ether sulfone). Thus, the teachings of U.S. Pat. No. '724 are twofold: (1) poly(biphenyl ether sulfone)s can be used for increasing the load bearing capabilities above the T_(g) of neat poly(aryl ether ketone)s, and (2) adding a poly(biphenyl ether sulfone) to a poly(aryl ether ketone) is expected to cause a substantial decrease of the chemical resistance.

Thus, in short, the skilled in the art, in view of the teachings of U.S. Pat. No. '724, would have understood that replacing part of the poly(aryl ether ketone) contained in a poly(aryl ether ketone) composition by a usually more cost-attractive polymer, in particular a poly(biphenyl ether sulfone), should not be an appropriate means to solve the complex problem of reducing the cost of the poly(aryl ether ketone) composition while substantially maintaining the chemical resistance conferred by the poly(aryl ether ketone).

THE INVENTION

A first aspect of the present invention is directed to the use of an effective amount (ε) of a poly(biphenyl ether sulfone) (P2) for diluting a poly(aryl ether ketone) (P1) contained in a polymer composition (C1) consisting of the poly(aryl ether ketone) (P1) and, optionally in addition, one or more ingredients (A) other than the poly(aryl ether ketone) (P1) and the poly(biphenyl ether sulfone) (P2), while at least substantially maintaining the chemical resistance of the polymer composition (C1) in a chemical environment (E) which is more aggressive against the poly(biphenyl ether sulfone) (P2) than against the poly(aryl ether ketone) (P1).

Another aspect of the present invention is directed to a method for diluting a poly(aryl ether ketone) (P1) contained in a polymer composition (C1) while at least substantially maintaining the chemical resistance of the polymer composition (C1) in the need thereof,

said polymer composition (C1) consisting of the poly(aryl ether ketone) (P1) and, optionally in addition, one or more ingredients (A) other than the poly(aryl ether ketone) (P1) and a poly(biphenyl ether sulfone) (P2), said chemical resistance of the polymer composition (C1) being at least substantially maintained in a chemical environment (E) which is more aggressive against the poly(biphenyl ether sulfone) (P2) than against the poly(aryl ether ketone) (P1),

said method comprising diluting the poly(aryl ether ketone) (P1) by an effective amount (s) of the poly(biphenyl ether sulfone) (P2).

According the above two aspects, the polymer composition (C1) may be in the form of a shaped article or part of a shaped article (S1).

Let us denote (C2) the polymer composition which can be obtained after the dilution of the poly(aryl ether ketone) (P1), in contrast with (C1) which denotes the polymer composition before the dilution.

Then, still another aspect of the present invention is directed to a polymer composition (C2) consisting of:

-   -   a poly(aryl ether ketone) (P1)     -   an effective amount (s) of a poly(biphenyl ether sulfone) (P2),         and     -   optionally in addition, one or more ingredients (A) other than         the poly(aryl ether ketone) (P1) and the poly(biphenyl ether         sulfone) (P2),         wherein the chemical resistance of said polymer composition (C2)         in a chemical environment (E) which is more aggressive against         the poly(biphenyl ether sulfone) (P2) than against the poly(aryl         ether ketone) (P1), is at least substantially maintained, when         compared to that of a polymer composition (C1) identical to the         polymer composition (C2), except the poly(biphenyl ether         sulfone) (P2) contained in the polymer composition (C2) has been         completely replaced, weight pro weight, by the poly(aryl ether         ketone) (P1).

Starting usually from a polymer composition (C1) consisting of 100 parts by weight (pbw.) of the poly(aryl ether ketone) (P1) and, optionally in addition, one or more ingredients (A) other than the poly(aryl ether ketone) (P1) and the poly(biphenyl ether sulfone) (P2), a polymer composition (C2) consisting of:

-   -   a poly(aryl ether ketone) (P1), in an amount of (100-ε) pbw, ε         as defined below,     -   an effective amount (ε pbw.) of a poly(biphenyl ether sulfone)         (P2), and     -   optionally in addition, one or more ingredients (A) other than         the poly(aryl ether ketone) (P1) and the poly(biphenyl ether         sulfone) (P2),         can be prepared by a method comprising:     -   providing the poly(biphenyl ether sulfone) (P2);     -   providing the poly(aryl ether ketone) (P1);     -   providing the ingredients (A), if any;     -   contacting, preferably mixing, an effective amount, namely ε         pbw., of the poly(biphenyl ether sulfone) (P2) with (100-ε) pbw.         of the poly(aryl ether ketone) (P1) and, the case being, the         ingredients (A),         so as to obtain the polymer composition (C2).

Still another aspect of the present invention is directed to a shaped article or to a part of a shaped article (S2) composed of the polymer composition (C2) as above described. A last aspect of the present invention is directed to an article assembly comprising said part.

DETAILED DESCRIPTION OF THE INVENTION

For the sake of clarity, the expression “for diluting a poly(aryl ether ketone) (P1) contained in a polymer composition (C1)” should herein be understood in its broad sense, namely: “for reducing the concentration of the poly(aryl ether ketone) (P1) contained in the polymer composition (C1)”. Typically, such dilution can be achieved by replacing part of the poly(aryl ether ketone) (P1) by the poly(biphenyl ether sulfone) (P2). A frequent benefit resulting from the dilution of the “concentrated” polymer composition [namely, the polymer composition (C1)] is that the so-obtained “diluted” polymer composition [namely, the polymer composition (C2)] is more cost-attractive, because poly(biphenyl ether sulfone) (s) are usually not as expensive as poly(aryl ether ketone)s.

The polymer composition (C1) may have been prepared and its chemical resistance may have been assessed by a certain skilled person, before said skilled person uses the poly(biphenyl ether sulfone) (P2) for diluting the poly(aryl ether ketone) (P1) contained in the polymer composition (C1) in accordance with the presently invented use. This scenario is however not required at all: the presently invented use should be understood to be implemented as well, notably, as soon as a polymer concentration (C2) is conceived by a skilled person to the purpose of exhibiting in a certain environment (E) a chemical resistance at least substantially equal to the effectively measured or reasonably estimated chemical resistance of a poly(aryl ether ketone)-containing poly(biphenyl ether sulfone)-free polymer composition (C1), whatever the way this person has been made aware of the effectively measured or reasonably estimated chemical resistance of the polymer composition (C1), and the so-conceived polymer composition (C2) is then prepared on this basis.

The fact that, according to the present invention, the chemical resistance of the polymer composition (C1) is at least substantially maintained means usually that the polymer composition (C2) (the “diluted” polymer composition) has a chemical resistance in the environment (E), which is either lower than but close to that of polymer concentration (C1) (the “concentrated” polymer composition), or equal to that of polymer concentration (C1), or greater than that of polymer concentration (C1). Otherwise said, in environment (E), the polymer composition (C2) has not a chemical resistance substantially lower than that of polymer concentration (C1).

Preferably, in the present invention, the chemical resistance of the polymer composition (C1) is at least essentially maintained, i.e. the polymer composition (C2) has usually a chemical resistance in the environment (E) which is the same or essentially the same as that of polymer concentration (C1), or it is greater than that of polymer concentration (C1).

Any amount of poly(biphenyl ether sulfone) (P2) which, when used for diluting the poly(aryl ether ketone) (P1) contained in the polymer composition (C1), makes it possible to at least substantially maintain [i.e. does not substantially impair] the chemical resistance of the polymer composition (C1) in the environment (E) should be viewed as an effective amount (ε), in the sense of the present invention.

As already explained, the effective amount (ε) of the poly(biphenyl ether sulfone) (P2) can dilute the poly(aryl ether ketone) (P1) contained in the polymer composition (C1) in an amount of 100 parts by weight (pbw.), by replacing, in said polymer composition (C1), ε pbw. of the poly(aryl ether ketone) (P1) by ε pbw. of the poly(biphenyl ether sulfone) (P2); thereby, a polymer composition (C2) containing (100-ε) pbw. of the poly(aryl ether ketone) (P1) and ε pbw. of the poly(biphenyl ether sulfone) (P2) can be obtained. When so defined, ε can range between 0 and 100 pbw.

From a theoretical point of view, ε can be as low as technically feasible, but amounts ε of poly(biphenyl ether sulfone) (P2), as defined in the previous paragraph, below than 1 pbw., are rarely desirable, because the so-achieved benefits of the dilution are in this case usually marginal. Thus, the effective amount (s) of the poly(biphenyl ether sulfone) (P2) is preferably above 2 pbw.; very preferably, it is above 5 pbw.

On the other hand, the effective amount (ε) should usually not exceed a certain upper limit, which depends notably on the nature of the poly(biphenyl ether sulfone), the nature of the poly(aryl ether ketone), the nature and amount of optional ingredient(s) (A), and the nature of environment (E). Thus, the skilled in the art will often observe, that when replacing weight pro weight an increasing amount of the poly(aryl ether ketone) (P1) by the poly(biphenyl ether sulfone) (P2), the chemical resistance of the polymer composition (C1) is at least maintained or, at least substantially maintained [exhibiting a “plateau” or “quasi-plateau” behaviour], as long as the amount of the poly(biphenyl ether sulfone) (P2) does not exceed a critical limit, above which respectively the chemical resistance decreases substantially, sometimes in a sharp manner, to reach finally a level close to that of the poly(biphenyl ether sulfone) (P1) (see FIGS. 1 and 2, commented in the section “Examples” of the present specification); the overall chemical resistance curve [i.e. from 0 to 100 parts of the poly(aryl ether ketone) (P1) replaced, weight pro weight, by the poly(biphenyl ether sulfone) (P2)] looks sometimes like a sigmoid (see FIG. 3, also commented in the section “Examples”). Thus:

-   -   in certain embodiments of the present invention, the effective         amount (ε) of the poly(biphenyl ether sulfone) (P2), as         previously defined, is preferably below 60 pbw.;     -   in certain other embodiments of the present invention, ε is         preferably below 50 pbw.;     -   in still certain other embodiments, ε is preferably below 40         pbw.; in still certain other embodiments, ε is preferably below         35 pbw.; in still certain other embodiments, ε is preferably         below 30 pbw.; in still certain other embodiments, ε is         preferably below 25 pbw.; in still certain other embodiments, ε         is preferably below 20 pbw.; in still certain other embodiments,         ε is preferably below 15 pbw.

The skilled in the art will be easily able to determine the value of ε that is best convenient for his use, depending notably on all the above cited parameters.

In general, in the present invention, the polymer compositions (C1) and (C2) are susceptible of being temporarily or permanently in contact with the chemical environment (E); often, such temporary or permanent contact is effectively achieved.

Non limitative examples of chemical compounds (cE) susceptible of constituting or being part of the chemical environment (E) include: carboxylic acid esters, carboxylic acids, glycol ethers, aliphatic hydrocarbons, aromatic hydrocarbons such as benzene and toluene, monostyrene, phenols, epoxies, epoxy precursors such as propylene glycol monoether and ethylene glycol diglycidyl ether, ketones, chlorinated hydrocarbons and aqueous solutions of inorganic acids such as nitric acid and sulfuric acid.

Good results were obtained notably when the environment (E) contained a halogenated hydrocarbon, in particular a chlorinated hydrocarbon, such as carbon tetrachloride, chloroform and methylene chloride. The chlorinated hydrocarbon may contain from 1 to 12 carbon atoms.

Good results were also obtained when the environment (E) contained a ketone. The ketone may be a C₃-C₁₂ acyclic compound comprising at least one ketone group such as like methyl ethyl ketone and acetone; it may also be a homo- or heterocyclic compound (the cycle of which comprises preferably from 4 to 10 atoms, such as carbon or nitrogen atoms) comprising at least one ketone group, such as N-methylpyrrolidinone.

The weight of the chemical compound (cE), notably when (cE) is a halogenated hydrocarbon or a ketone, based on the total weight of the environment (E) may be higher than 10, 20, 50, 75 or 90%; in certain embodiments, the environment (E) may consist essentially of, or even consist of, the chemical compound (cE).

The chemical resistance of the polymer compositions (C1) and (C2) in the environment (E) can be assessed by any suitable parameter, and said parameter can itself be obtained by any suitable method. An example of such suitable parameter is the “retention ratio”, namely the ratio of the value of a certain physical or chemical property of the polymer compositions (C1) and (C2) before they are contacted, temporarily or permanently, with the chemical environment (E), to the value of the same physical or chemical property of the polymer compositions (C1) and (C2) after they have been contacted with the same chemical environment (E).

The property of concern can be notably a mechanical property, such as the tensile strength, the tensile modulus, the flexural strength or the flexural modulus. The tensile properties can be determined notably according to ASTM method D-638, while the flexural properties can be determined notably according to ASTM method D-790.

In certain embodiments of the present invention, the polymer compositions (C1) and (C2) are not submitted to stress.

In certain other embodiments of the present invention, the polymer compositions (C1) and (C2) are submitted to stress; the case being, they may be submitted to stress either temporarily or permanently.

The Poly(Biphenyl Ether Sulfone) (P2)

For the purpose of the invention, a poly(biphenyl ether sulfone) is intended to denote a polycondensation polymer of which more than 50 wt. % of the recurring units are recurring units (R2) of one or more formulae containing at least one p-biphenylene group:

at least one ether group (—O—) and at least one sulfone group (—SO₂—).

Preferably, recurring units (R2) are of one or more formulae of the general type:

wherein R₁ through R₄ are —O—, —SO₂—, —S—, —C(═O)—, with the proviso that at least one of R₁ through R₄ is —SO₂— and at least one of R₁ through R₄ is —O—; Ar₁, Ar₂ and Ar₃ are arylene groups containing 6 to 24 carbon atoms, and are preferably phenylene or p-biphenylene; and a and b are either 0 or 1.

More preferably, recurring units (R2) are chosen from

Still more preferably, recurring units (R2) are:

For the purpose of the present invention, a polyphenylsulfone (PPSU) polymer is intended to denote any polymer of which more than 50 wt. % of the recurring units are recurring units (R2) of formula (2).

The poly(biphenyl ether sulfone) (P2) may be notably a homopolymer, a random, alternate or block copolymer. When the poly(biphenyl ether sulfone) (P2) is a copolymer, its recurring units may notably be composed of (i) recurring units (R2) of at least two different formulae chosen from formulae (2) to (6), or (ii) recurring units (R2) of one or more formulae (2) to (6) and recurring units (R2*), different from recurring units (R2), such as:

Preferably more than 70 wt. %, more preferably more than 85 wt. % of the recurring units of the poly(biphenyl ether sulfone) (P2) are recurring units (R2). Still more preferably, essentially all the recurring units of the poly(biphenyl ether sulfone) (P2) are recurring units (R2). Most preferably, all the recurring units of the poly(biphenyl ether sulfone) (P2) are recurring units (R2).

Excellent results were obtained when the poly(biphenyl ether sulfone) (P2) was a PPSU homopolymer, i.e. a polymer of which essentially all, if not all, the recurring units are of formula (2). RADEL® R polyphenylsulfone from Solvay Advanced Polymers, L.L.C. is an example of a PPSU homopolymer.

The poly(biphenyl ether sulfone) (P2) can be prepared by any method. Methods well known in the art are those described in U.S. Pat. Nos. 3,634,355; 4,008,203; 4,108,837 and 4,175,175, the whole content of which is herein incorporated by reference.

The Poly(Aryl Ether Ketone) (P1).

As previously mentioned, the polymer composition (C1) contains a poly(aryl ether ketone) (P1).

For the purpose of the present invention, the term “poly(aryl ether ketone)” is intended to denote any polymer of which more than 50 wt. % of the recurring units are recurring units (R1) of one or more formulae containing at least one arylene group, at least one ether group (—O—) and at least one ketone group [—C(═O)—].

Preferably, recurring units (R1) are chosen from:

wherein:

-   -   Ar is independently a divalent aromatic radical selected from         phenylene, biphenylene or naphthylene,     -   X is independently O, C(═O) or a direct bond,     -   n is an integer of from 0 to 3,     -   b, c, d and e are 0 or 1,     -   a is an integer of 1 to 4, and     -   preferably, d is 0 when b is 1.

More preferably, recurring units (R1) are chosen from:

Still more preferably, recurring (R1) are chosen from:

Most preferably, recurring units (R1) are:

For the purpose of the present invention, a PEEK polymer is intended to denote any polymer of which more than 50 wt. % of the recurring units are recurring units (R1) of formula (VII).

The poly(aryl ether ketone) (P1) may be notably a homopolymer, a random, alternate or block copolymer. When the poly(aryl ether ketone) (P1) is a copolymer, it may notably contain (i) recurring units (R1) of at least two different formulae chosen form formulae (VI) to (XXI), or (ii) recurring units (R1) of one or more formulae (VI) to (XXI) and recurring units (R1*) different from recurring units (R1).

Preferably more than 70 wt. %, more preferably more than 85 wt. % of the recurring units of the poly(aryl ether ketone) (P1) are recurring units (R1). Still more preferably, essentially all the recurring units of the poly(aryl ether ketone) (P1) are recurring units (R1). Most preferably, all the recurring units of the poly(aryl ether ketone) (P1) are recurring units (R1).

Excellent results were obtained when the poly(aryl ether ketone) (P1) was a PEEK homopolymer, i.e. a polymer of which essentially all, if not all, the recurring units are of formula (VII).

The poly(aryl ether ketone) (P1) has a reduced viscosity (RV) of advantageously at least 0.55 dl/g and preferably of at least 0.70 dl/g; besides, the RV of the poly(aryl ether ketone) (P1) is advantageously of at most 1.10 dl/g and preferably of at most 0.90 dl/g. The reduced viscosity (RV) is measured in 95-98% sulfuric acid (d= 1.84 g/ml) at a poly(aryl ether ketone) concentration of 1 g/100 ml. The measurement is performed using a No 50 Cannon-Fleske viscometer. RV is measured at 25° C. in a time less than 4 hours after dissolution, to limit sulfonation.

The poly(aryl ketone) (P1) can be prepared by any method.

One well known in the art method comprises reacting a substantially equimolar mixture of at least one bisphenol and at least one dihalobenzoid compound or at least one halophenol compound as described in Canadian Pat. No. 847,963. Preferred bisphenols in such a process are hydroquinone, 4,4′-dihydroxybiphenyl and 4,4′-dihydroxybenzophenone; preferred dihalobenzoid compounds in such a process are 4,4′-difluorobenzophenone, 4,4′-dichlorobenzophenone and 4-chloro-4′-fluorobenzophenone; preferred halophenols compounds in such a process are 4-(4-chlorobenzoyl)phenol and (4-fluorobenzoyl)phenol. Accordingly, PEEK homopolymers may notably be produced by the nucleophilic process as described in, for example, U.S. Pat. No. 4,176,222, the whole content of which is herein incorporated by reference.

Another well known in the art method to produce PEEK homopolymers comprises electrophilically polymerizing phenoxyphenoxybenzoic acid or the like, using an alkane sulfonic acid as solvent and in the presence of a condensing agent, as the process described in U.S. Pat. No. 6,566,484, the whole content of which is herein incorporated by reference. Other poly(aryl ether ketone)s may be produced by the same method, starting from other monomers than phenoxyphenoxybenzoic acid, such as those described in U.S. Pat. Appl. 2003/0130476, the whole content of which is also herein incorporated by reference.

Optional Ingredients (A) of the Polymer Compositions (C1) and (C2)

The polymer compositions (C1) and (C2) may further contain conventional ingredients of poly(aryl ether ketone) compositions, including lubricating agents, heat stabilizers, anti-static agents, organic and/or inorganic pigments like TiO₂, carbon black, acid scavengers, such as MgO, stabilizers, i.e., metal oxides and sulphides such as zinc oxide and zinc sulphide, antioxidants, flame retardants, smoke-suppressing agents, and fillers, collectively referred to as ingredients (A).

If ingredients (A) are present, their weight, based on the total weight of the polymer composition (C1) [or based on the total weight of the polymer composition (C2)], is advantageously below 50%, preferably below 30 wt. %, more preferably below 10% and still more preferably below 5%. Excellent results were observed when the polymer compositions (C1) and (C2) were free of ingredients (A), i.e. they consisted of the poly(aryl ether ketone) (P1) and the poly(biphenyl ether sulfone) (P2).

The polymer compositions (C1) and (C2) are advantageously prepared by any conventional mixing method. A preferred method comprises dry mixing the ingredients of the polymer compositions of concern in powder or granular form, using e.g. a mechanical blender, then extruding the mixture into strands and chopping the strands into pellets.

Non limitative examples of shaped articles or part of shaped articles susceptible of being in accordance with the present invention include parts of aircraft passenger service units, air return grills in aircrafts, parts of aicraft heating systems, parts of aircraft ventilation systems, parts encapsulating a dry transformer or a motor coil, food service equipments, dental cases, medical instruments, plumbing fittings, fixtures, ball bearings and ball bearing retainer cages, pump bearings, needles, medical trays, coatings, wire and cable coatings, insulative films and thrustwashers.

Provided below are examples illustrative of the present invention, but not limitative thereof.

EXAMPLES

Five polymer compositions were prepared by blending PEEK with PPSU in various amounts, namely polymer compositions E1, E2, E3, E4 and E5. Polymer compositions composed of PEEK only on one hand, and PPSU only on the other hand, were also prepared as comparative examples, namely polymer compositions CE1 and CE2. The nature and amount of all the ingredients contained in the examplified polymer compositions are listed in table 1.

TABLE 1 Samples formulation Ingredients CE1 E1 E2 E3 E4 E5 CE2 VICTREX ® 100 90 80 70 60 50  0 150P PEEK RADEL R ®  0 10 20 30 40 50 100 5000 NT PPSU VICTREX ® 150P powdered PEEK resin was available from VICTREX Manufacturing Ltd. and RADEL ® R 5000 NT PPSU resin was available from SOLVAY ADVANCED POLYMERS, L.L.C.

Preparation of Specimens of the Polymer Compositions.

All polymer compositions were prepared by melt compounding the ingredients as listed in Table 1, using a Berstorff 25 mm twin screw extruder having eight barrel segments with seven heated zones and an overall length to diameter ratio of 33:1. The extruder was equipped with a vacuum vent at barrel 6 which was maintained under vacuum during all the compounding runs. The compositions were fed to the extruder by metering the ingredients into the feed throat of the extruder using gravimetric feeders which feed them at the appropriate rates to produce the desired blend ratio in each case. Detailed compounding conditions are shown in Table 2. The compounded resins were stranded into a water trough for cooling and solidification and was then diced into pellets.

TABLE 2 Compounding Run Parameters Used for Compounding Set Points For CE1, E1, E2, E3, E4 and E5 For CE2 Barrel 2 Temp. (° C.) 330 315 Barrel 3 Temp. (° C.) 330 320 Barrel 4 Temp. (° C.) 340 350 Barrel 5 Temp. (° C.) 350 345 Barrel 6 Temp. (° C.) 350 345 Barrel 7 Temp. (° C.) 350 340 Barrel 8 Temp. (° C.) 350 345 Die Adapter (° C.) 360 345 Die (° C.) 360 345 Melt Temperature (° C.) 390-400 390-395 Screw Speed (rpm) 230 220

The pellets of each polymer composition (E1, E2, E3, E4, E5, CE1 and CE2) were then injection molded into ASTM 3.2 mm thick flexural bars using a 50 ton Sumitomo injection molding machine equipped with a 25 mm screw and having a 51 cm³ shot capacity. Injection molding conditions were such that the resin melt temperature was maintained at 385-400° C. for all the samples and mold temperature was maintained at 170-180° C. All bars were then annealed at 200° C. for 1 hour prior to chemical resistance evaluations to ensure all parts were crystallized to the fullest extent possible.

Chemical Exposure Experiments.

The chemical resistance evaluation of the various compositions was conducted by measuring the flexural properties at room temperature (23° C.) on the as molded test bars, and on the same bars but following a 10-day and a day immersion exposure in 3 different solvents, namely methyl ethyl ketone (MEK), chloroform and N-methylpyrrolidinone (NMP). All these are well known to be aggressive solvents toward many plastics. NMP and chloroform are so aggressive that they can actually dissolve PPSU; MEK, while being a weak solvent of PPSU, is still detrimental to its mechanical integrity.

The bars were simply dried with paper towels after removal from the chemical exposure baths and before conducting the flexural property measurements. The flexural property measurements before and after solvent exposure were all conducted according to ASTM method D-790.

Results.

Polymer compositions testing results after immersion in MEK are shown in table 3.

TABLE 3 Results of chemical resistance towards MEK Days MEK Exposure CE1 E1 E2 E3 E4 E5 CE2 Flex Strength 0 23400 21900 20400 19800 18900 18200 14300 Flex Strength 10 24000 20900 21200 19900 19500 18200 — Retention ratio 10 1.03 0.95 1.04 1.01 1.03 1.00 0.00 Flex Strength 30 23600 22500 21200 20900 19700 18800 — Retention ratio 30 1.01 1.03 1.04 1.06 1.04 1.03 0.00 Flex Modulus 0 584 537 497 479 454 433 337 Flex Modulus 10 595 506 516 481 475 436 — Retention ratio 10 1.02 0.94 1.04 1.00 1.05 1.01 0.00 Flex Modulus 30 577 546 511 505 472 448 — Retention ratio 30 0.99 1.02 1.03 1.05 1.04 1.03 0.00

The Radel® R sample (CE2) was partially dissolved and ruptured in MEK after only 10 days of immersion. On the other hand, likewise the neat PEEK sample (CE1), samples E1 to E5, which contained up to 50 pbw. of PPSU (PPSU/PEEK wt. ratio=1, example E5), maintained surprisingly the level of their flexural properties “as molded”, even after a 30-day immersion, as evidenced by retention ratios of about 1.

FIG. 1 shows a graphical representation of the flexural strength retention ratios after 30 days of exposure to MEK. The flexural strength retention ratios were plotted versus the PEEK wt. % of the different polymer blends tested. In this case, the equivalence to PEEK in terms of retention of the flexural properties was unexpectedly achieved for PPSU/PEEK ratios at least as high as 50/50. Still more surprisingly, the Applicant has found that the retention ratio of certain blends even exceeded to some extent that of neat PEEK.

Polymer compositions testing results after immersion in chloroform are

shown in table 4.

TABLE 4 Results of chemical resistance towards chloroform Days Chloroform Exposure CE1 E1 E2 E3 E4 E5 CE2 Flex Strength 0 23400 21900 20400 19800 18900 18200 14300 Flex Strength 10 22800 21200 19700 18600 13500 10100 — Retention ratio 10 0.97 0.97 0.97 0.94 0.71 0.55 0.00 Flex Strength 30 23600 22500 20400 18400 11900 10000 — Retention ratio 30 1.01 1.03 1.00 0.93 0.63 0.55 0.00 Flex Modulus 0 584 537 497 479 454 433 337 Flex Modulus 10 556 518 487 470 409 333 — Retention ratio 10 0.95 0.96 0.98 0.98 0.90 0.77 0.00 Flex Modulus 30 572 549 509 483 414 369 — Retention ratio 30 0.98 1.02 1.02 1.01 0.91 0.85 0.00

While the Radel® R sample (CE2) was completely dissolved in chloroform after only 10 days of immersion, samples E1 to E3 maintained surpringly the level of their flexural properties “as molded” even after a 30-day immersion.

FIG. 2 shows a graphical representation of the flexural strength retention ratios after 30 days of exposure to chloroform. The flexural strength retention ratios were plotted versus the PEEK wt. % of the different polymer blends tested. With chloroform as the chemical environment (E), the equivalence to PEEK in terms of retention of the flexural properties was unexpectedly achieved for PPSU/PEEK ratios as high as 30/70.

Polymer compositions testing results after immersion in NMP are shown in table 5.

TABLE 5 Results of chemical resistance towards NMP Days NMP Exposure CE1 E1 E2 E3 E4 E5 CE2 Flex Strength 0 23400 21900 20400 19800 18900 18200 14300 Flex Strength 10 22900 21700 20400 19500 10600 6100 — Retention ratio 10 0.98 0.99 1.00 0.98 0.56 0.34 0.00 Flex Strength 30 24600 21800 20800 19500 7100 3800 — Retention ratio 30 1.05 1.00 1.02 0.98 0.38 0.21 0.00 Flex Modulus 0 584 537 497 479 454 433 337 Flex Modulus 10 567 530 497 475 241 134 — Retention ratio 10 0.97 0.99 1.00 0.99 0.53 0.31 0.00 Flex Modulus 30 573 529 499 471 169 80 — Retention ratio 30 0.98 0.99 1.00 0.98 0.37 0.18 0.00

While the Radel® R sample (CE2) was completely dissolved in NMP after only 10 days of immersion, samples E1 to E3 maintained unexperctedly the level of their flexural properties even after a 30-day immersion.

FIG. 3 shows a graphical representation of the flexural strength retention ratios after 30 days of exposure to NMP. The flexural strength retention ratios were plotted versus the PEEK wt. % of the different polymer blends tested. With NMP as the chemical environment (E), the equivalence to PEEK in terms of retention of flexural properties was again unexpectedly achieved for PPSU/PEEK ratios as high as 30/70.

All these experimental data showed surprisingly that diluting PEEK with an effective amount of PPSU results in PEEK-PPSU blends having at least substantially the same chemical resistance as neat PEEK (while the test is performed in a chemical environment which is much more aggressive against PPSU than against PEEK), and is an attractive means of for reducing substantially the costs of the polymer material. 

1-16. (canceled)
 17. A method for diluting a poly(aryl ether ketone) (P1) contained in a polymer composition (C1) while at least substantially maintaining the chemical resistance of the polymer composition (C1) in the need thereof, said polymer composition (C1) consisting of the poly(aryl ether ketone) (P1) and, optionally in addition, one or more ingredients (A) other than the poly(aryl ether ketone) (P1) and a poly(biphenyl ether sulfone) (P2), said chemical resistance of the polymer composition (C1) being at least substantially maintained in a chemical environment (E) which is more aggressive against the poly(biphenyl ether sulfone) (P2) than against the poly(aryl ether ketone) (P1), said method comprising diluting the poly(aryl ether ketone) (P1) by an effective amount (ε) of the poly(biphenyl ether sulfone) (P2).
 18. The method according to claim 17, wherein the effective amount (ε) of the poly(biphenyl ether sulfone) (P2) is below 50 parts by weight (pbw.), said effective amount (ε) of the poly(biphenyl ether sulfone) (P2) diluting the poly(aryl ether ketone) (P1) contained in the polymer composition (C1) in an amount of 100 pbw., by replacing, in said polymer composition (C1), ε pbw. of the poly(aryl ether ketone) (P1) by ε pbw. of the poly(biphenyl ether sulfone) (P2), thereby obtaining a polymer composition (C2) consisting of (100-ε) pbw. of the poly(aryl ether ketone) (P1), ε pbw. of the poly(biphenyl ether sulfone) (P2), and, optionally in addition, the one or more ingredients (A).
 19. The method according to claim 18, wherein the effective amount (ε) of the poly(biphenyl ether sulfone) (P2) is below 30 pbw.
 20. The method according to claim 18, wherein the effective amount (ε) of the poly(biphenyl ether sulfone) (P2) ranges between 5 and 25 pbw.
 21. The method according to claim 17, wherein the chemical resistance of the polymer composition (C1) is at least essentially maintained.
 22. The method according to claim 17, wherein the poly(biphenyl ether sulfone) (P2) is a polymer of which essentially all the recurring units are recurring units (R2) of one or more formulae containing at least one p-biphenylene group:

at least one ether group (—O—) and at least one sulfone group (—SO₂—).
 23. The method according to claim 17, wherein the poly(biphenyl ether sulfone) (P2) is a polymer of which more than 50 wt. % of the recurring units are recurring units (R2) of formula


24. The method according to claim 17, wherein the poly(biphenyl ether sulfone) (P2) is a polyphenylsulfone (PPSU) homopolymer of which essentially all the recurring units are recurring units (R2) of formula


25. The method according to claim 17, wherein the poly(aryl ether ketone) (P1) is a polymer of which essentially all the recurring units are recurring units (R1) of one or more formulae containing at least one arylene group, at least one ether group (—O—) and at least one ketone group [—C(═O)—],
 26. The method according to claim 17, wherein the poly(aryl ether ketone) (P1) is a polymer of which more than 50 wt, % of the recurring units are recurring units (R1) of formula


27. The method according to claim 17, wherein the poly(aryl ether ketone) (P1) is a PEEK homopolymer of which essentially all the recurring units are recurring units (R1) of formula


28. The method according to claim 17, wherein the chemical environment (E) contains a chemical compound (cE) chosen from carboxylic acid esters, carboxylic acids, glycol ethers, aliphatic hydrocarbons, aromatic hydrocarbons, monostyrene, phenols, epoxies, epoxy precursors, ketones, chlorinated hydrocarbons and aqueous solutions of inorganic acids such as nitric acid and sulfuric acid.
 29. The method according to claim 18, wherein the chemical resistance of the polymer compositions (C1) and (C2) in the environment (E) is assessed by a retention ratio parameter, said retention ratio parameter being the ratio of the value of a property of the polymer compositions (C1) and (C2) before they are contacted, temporarily or permanently, with the chemical environment (E), to the value of the same property of the polymer compositions (C1) and (C2) after they have been contacted with the same chemical environment (E), said property being a mechanical property selected from the group consisting of a tensile strength, a tensile modulus, a flexural strength and a flexural modulus, said tensile strength and said tensile modulus being determined according to ASTM method D-638, and said flexural strength and said flexural modulus being determined according to ASTM method D-790.
 30. The method according to claim 29, wherein the property is the flexural strength as determined according to ASTM method D-790.
 31. The method according to claim 17, wherein the polymer composition (C1) is in the form of a shaped article or a part of shaped article (S1).
 32. A polymer composition (C2) consisting of; a poly(aryl ether ketone) (P1) an effective amount (ε) of a poly(biphenyl ether sulfone) (P2), and optionally in addition, one or more ingredients (A) other than the poly(aryl ether ketone) (P1) and the poly(biphenyl ether sulfone) (P2). wherein the chemical resistance of said polymer composition (C2) in a chemical environment (E) which is more aggressive against the poly(biphenyl ether sulfone) (P2) than against the poly(aryl ether ketone) (P1), is at least substantially maintained, when compared to that of a polymer composition (C1) identical to the polymer composition (C2), except the poly(biphenyl ether sulfone) (P2) contained in the polymer composition (C2) has been completely replaced, weight pro weight, by the poly(aryl ether ketone) (P1).
 33. A shaped article (S2) composed of the polymer composition (C2) according to claim
 32. 34. A part of a shaped article (S2) composed of the polymer composition (C2) according to claim
 32. 35. An article assembly comprising the part according to claim
 34. 36. A method for diluting a poly(aryl ether ketone) (P1) contained in a polymer composition (C1) in an amount of 100 parts by weight (pbw.), while at least substantially maintaining the chemical resistance of the polymer composition (C1) in the need thereof, said polymer composition (C1) consisting of the poly(aryl ether ketone) (P1) and, optionally in addition, one or more ingredients (A) other than the poly(aryl ether ketone) (P1) and a poly(biphenyl ether sulfone) (P2). said poly(aryl ether ketone) (P1) being a PEEK homopolymer of which essentially all the recurring units are recurring units (R1) of formula

said poly(biphenyl ether sulfone) (P2) being a polyphenylsulfone (PPSU) homopolymer of which essentially all the recurring units are recurring units (R2) of formula

said chemical resistance of the polymer composition (C1) being at least substantially maintained in a chemical environment (E) which is more aggressive against the poly(biphenyl ether sulfone) (P2) than against the poly(aryl ether ketone) (P1), said chemical environment (E) containing a chemical compound (cE) chosen from carboxylic acid esters, carboxylic acids, glycol ethers, aliphatic hydrocarbons, aromatic hydrocarbons, monostyrene, phenols, epoxies, epoxy precursors, ketones, chlorinated hydrocarbons and aqueous solutions of inorganic acids such as nitric acid and sulfuric acid, said method comprising diluting the poly(aryl ether ketone) (P1) by an effective amount (ε) of the poly(biphenyl ether sulfone) (P2) by replacing, in said polymer composition (C1), ε pbw. of the poly(aryl ether ketone) (P1) by ε pbw. of the poly(biphenyl ether sulfone) (P2), said effective amount (ε) being below 50 pbw., thereby obtaining a polymer composition (C2) consisting of (100-ε) pbw. of the poly(aryl ether ketone) (P1), ε pbw. of the poly(biphenyl ether sulfone) (P2), and, optionally in addition, the one or more ingredients (A), wherein the chemical resistance of the polymer compositions (C1) and (C2) in the environment (E) is assessed by a retention ratio parameter, said retention ratio parameter being the ratio of the value of a property of the polymer compositions (C1) and (C2) before they are contacted, temporarily or permanently, with the chemical environment (E), to the value of the same property of the polymer compositions (C1) and (C2) after they have been contacted with the same chemical environment (E), said property being a mechanical property selected from the group consisting of a tensile strength, a tensile modulus, a flexural strength and a flexural modulus, said tensile strength and said tensile modulus being determined according to ASTM method D-638, said flexural strength and said flexural modulus being determined according to ASTM method D-790. 